Oxford Applied Research

DC Ion Sources


The DC filament-driven ion sources are an extension to the highly successful family of atom sources from Oxford Applied Research. They have been extensively developed with simple operation and servicing in mind. The flange mount sources are UHV compatible and primarily for use with argon. They
are highly suited for applications such as ion-beam assisted deposition (IBAD), sputter deposition, etching, and substrate cleaning.

 

A high-transparency grid-set is used to extract ions from the plasma, resulting in a high beam current density and excellent beam profiles. The DC25s ion source has been developed in response to increased demand for high ion currents at very low energies (< 20eV).

 

Specification

Model DC25 DC25s DC150
Standard in-vacuum length 100mm 100mm 230mm
Beam diameter 25mm 25mm 150mm
Mounting flange * NW63CF NW63CF NW200CF
Ion beam energy 100eV-1keV 10eV-200keV 100eV-1keV
Beam current 40mA (max)** 5mA (max) 300mA (max)
Operating gas flow 3-10 sccm 3-10 sccm 15-20 sccm
Power supplies

Included

(single unit)

Included

(single unit)

Included
Grid material Inconel, Mo*** Inconel, Mo*** Inconel, Mo***
       
* For externally mounted source. Internally mounted sources are also available
** Gas dependent
*** Parallel, concave, convex grid-set options