Oxford Applied Research
Nanocluster Solutions
Oxford Applied Research supplies a number of products to meet the increasing demands of the nanoscience community. The nanocluster sources can be used to deposit a wide range of clustered materials for applications raning from research into the fundamental properties of nanoscale structures, to industrial applications such as cataysis and highly adherent films. The nanocluster source is capable of producing beams of well defined nanocrystalline particles using the gas condensation method.
In addition to the sources we can provide a high-mass quardrupole to measure the cluster mass and size-select the ionised clusters from the sources. Furthermore we offer a complete nanocluster deposition system. The source is fully UHV compatible and bakeable.
Specifications
| NC200U Nanocluster Source | |
| Material source | Magnetron |
| Deposition rate | <0.001nm/s to ~0.5nm/s (for Cu, cluster size dependent) |
| Mean cluster sizes | <0.4nm to ~10nm in diameter |
| Ar flow rate required | 10-100sccm |
| Beam diameter | 5mm to 40mm at a source-sample distance of 100mm (for Cu) |
| Aggregation length | Variable |
| Power supply | 1kW supply included |
| Source mounting | NW150CF or to customer requirement |
| Water cooling | 0.5l/s - de-ionised water advisable |
| Services | 500l/s differential pumping, liq. Nitrogen, Ar and He |
| Options | Gencoa Fe targets |
| QMF200 Quadrupole Mass Filter | |
| Mass range | 50 to 3x106 a.m.u. |
| Ultimate resolution | ~2% (standard model) |
| Mounting | In NW150CF tubulation |
| Options | QUVI Software control |
| Nanodep60 Nanocluster Deposition System | |
| Cluster source | NC200U (as above) |
| Mass measurement | QMF200 (as above) |
| Rate measurement | Quartz crystal monitor on linear drive |
| Deposition chamber | Base pressure <1x10-9. Numerous ports available |
| Pumping | Turbos with backing pumps. 1000l/s on chamber, 500l/s on source 70l/s on load lock. |
| Pressure measurement | Ion gauge on system. Pirani gauges on source and backing lines. |
| Frame | Aluminium support |
| Electronics | 2 racks house system and instrument power supplies |
| Valves | 2 Gate valves (1 on load-lock, 1 to cluster source) |
| Bake-out | Internal heaters and external band heaters |
| Sample loading | By load lock |
| Sample heating | On load-lock arm. To 800oC with PSU |
| Gas input | 2x Mass flow controllers on NC200U with PSU. |
| Services required | Ar and He gases. Liq N cooling, water cooling, pump exhaust 2 |
| Options | As for NC200 and QMF200. Sample manipulator and holder. |